Subject: General Tech | November 5, 2016 - 11:01 AM | Scott Michaud
Tagged: Samsung, euv, 7nm, 14nm, 10nm
As the comments usually remind us, the smallest feature size varies in interpretation from company to company, and node to node. You cannot assume how Samsung compares with Intel, GlobalFoundries, or TSMC based on the nanometer rating alone, better or worse. In fact, any specific fabrication process, when compared to another one, might be better in some ways yet worse in others.
With all of that in mind, Samsung has announced the progress they've made with 14nm, 10nm, and 7nm fabrication processes. First, they plan to expand 14nm production with 14LPU. I haven't been able to figure out what this specific branding stands for, but I'm guessing it's something like “Low Power Ultra” given that it's an engineering name and those are usually super literal (like the other suffixes).
As for the other suffixes, Samsung begins manufacturing nodes with Low Power Early (LPE). From there, they improve upon their technique, providing higher performance and/or lower power, and call this new process Low Power Plus (LPP). LPC, which I believe stands for something like Low Power Cost, although I haven't seen this acronym officially expanded, removes a few manufacturing steps to make the end product cheaper. LPU is an extension of LPC with higher performance. Add the appropriate acronym as a suffix to the claimed smallest feature size, and you get the name of the node: xxLPX.
14LPU is still a ways out, though. Their second announcement, 10LPU, is expected to be their cost-reduction step for 10nm, which I interpret to mean they are omitting LPC from their 10nm production. You may think this is very soon, given how 10LPE has just started mass production a few weeks ago. Really, this is a quite early announcement in terms of overall 10nm production. The process design kits (PDKs) for both 14LPU and 10LPU, which are used by hardware vendors to design their integrated circuits, won't ship until 2Q17. As such, products will be a while behind that.
To close out, Samsung reiterated that 7nm is planned to use extreme ultraviolet lithography (EUV). They have apparently created a wafer using 7nm EUV, but images do not seem to be provided.
Development kits for 14LPU and 10LPU are expected to ship in the second quarter of 2017.
GlobalFoundries Will Allegedly Skip 10nm and Jump to Developing 7nm Process Technology In House (Updated)
Subject: Processors | August 20, 2016 - 07:06 PM | Tim Verry
Tagged: Semiconductor, lithography, GLOBALFOUNDRIES, global foundries, euv, 7nm, 10nm
UPDATE (August 22nd, 11:11pm ET): I reached out to GlobalFoundries over the weekend for a comment and the company had this to say:
"We would like to confirm that GF is transitioning directly from 14nm to 7nm. We consider 10nm as more a half node in scaling, due to its limited performance adder over 14nm for most applications. For most customers in most of the markets, 7nm appears to be a more favorable financial equation. It offers a much larger economic benefit, as well as performance and power advantages, that in most cases balances the design cost a customer would have to spend to move to the next node.
As you stated in your article, we will be leveraging our presence at SUNY Polytechnic in Albany, the talent and know-how gained from the acquisition of IBM Microelectronics, and the world-class R&D pipeline from the IBM Research Alliance—which last year produced the industry’s first 7nm test chip with working transistors."
An unexpected bit of news popped up today via TPU that alleges GlobalFoundries is not only developing 7nm technology (expected), but that the company will skip production of the 10nm node altogether in favor of jumping straight from the 14nm FinFET technology (which it licensed from Samsung) to 7nm manufacturing based on its own in house design process.
Reportedly, the move to 7nm would offer 60% smaller chips at three times the design cost of 14nm which is to say that this would be both an expensive and impressive endeavor. Aided by Extreme Ultraviolet (EUV) lithography, GlobalFoundries expects to be able to hit 7nm production sometime in 2020 with prototyping and small usage of EUV in the year or so leading up to it. The in house process tech is likely thanks to the research being done at the APPC (Advanced Patterning and Productivity Center) in Albany New York along with the expertise of engineers and design patents and technology (e.g. ASML NXE 3300 and 3300B EUV) purchased from IBM when it acquired IBM Microelectronics. The APPC is reportedly working simultaneously on research and development of manufacturing methods (especially EUV where extremely small wavelengths of ultraviolet light (14nm and smaller) are used to etch patterns into silicon) and supporting production of chips at GlobalFoundries' "Malta" fab in New York.
Advanced Patterning and Productivity Center in Albany, NY where Global Foundries, SUNY Poly, IBM Engineers, and other partners are forging a path to 7nm and beyond semiconductor manufacturing. Photo by Lori Van Buren for Times Union.
Intel's Custom Foundry Group will start pumping out ARM chips in early 2017 followed by Intel's own 10nm Cannon Lake processors in 2018 and Samsung will be offering up its own 10nm node as soon as next year. Meanwhile, TSMC has reportedly already tapped out 10nm wafers and will being prodction in late 2016/early 2017 and claims that it will hit 5nm by 2020. With its rivals all expecting production of 10nm chips as soon as Q1 2017, GlobalFoundries will be at a distinct disadvantage for a few years and will have only its 14nm FinFET (from Samsung) and possibly its own 14nm tech to offer until it gets the 7nm production up and running (hopefully!).
Previously, GlobalFoundries has stated that:
“GLOBALFOUNDRIES is committed to an aggressive research roadmap that continually pushes the limits of semiconductor technology. With the recent acquisition of IBM Microelectronics, GLOBALFOUNDRIES has gained direct access to IBM’s continued investment in world-class semiconductor research and has significantly enhanced its ability to develop leading-edge technologies,” said Dr. Gary Patton, CTO and Senior Vice President of R&D at GLOBALFOUNDRIES. “Together with SUNY Poly, the new center will improve our capabilities and position us to advance our process geometries at 7nm and beyond.”
If this news turns out to be correct, this is an interesting move and it is certainly a gamble. However, I think that it is a gamble that GlobalFoundries needs to take to be competitive. I am curious how this will affect AMD though. While I had expected AMD to stick with 14nm for awhile, especially for Zen/CPUs, will this mean that AMD will have to go to TSMC for its future GPUs or will contract limitations (if any? I think they have a minimum amount they need to order from GlobalFoundries) mean that GPUs will remain at 14nm until GlobalFoundries can offer its own 7nm? I would guess that Vega will still be 14nm, but Navi in 2018/2019? I guess we will just have to wait and see!
- To 7nm And Beyond (Interview @ Semiconductor Engineering)
- GloFo Looks For 7nm Leadership @ Electronics Weekly
- GlobalFoundries develops 7nm and 10nm technologies in-house @ KitGuru
- SUNY Poly and GLOBALFOUNDRIES Announce New $500M R&D Program in Albany To Accelerate Next Generation Chip Technology @ GlobalFoundries (PR)
- AMD GPU Roadmap: Capsaicin Names Upcoming Architectures @ PC Perspective
- Next Gen Graphics and Process Migration: 20 nm and Beyond @ PC Perspective
Subject: General Tech | February 27, 2014 - 04:37 PM | Jeremy Hellstrom
Tagged: euv, photolithography, Intel, TSMC, DSA
A recent test at TSMC proved their experimental extreme UV lithography process is a little too extreme after a misaligned laser caused serious internal damage to their prototype. This is rather sad news for TSMC as EUV has been touted as the best way to reduce the chip making process below 10nm. Intel has been hedging their bets about EUV, they have invested heavily in the development of the technology but recently have teamed up with ASML Holdings and Arkema to work on directed self assembly, where the chips are convinced to form out of solution on a molecular basis. We are not quite talking Von Neumann machines but it is certainly within the same realm of thought. Other researchers are working on electron etching; forsaking light and its comparatively large wavelength for much smaller etching tools. You can read more about how companies such as Intel are trying to keep Moore's law alive at The Register.
"A recent test of the next-generation chip-etching technology known as extreme ultraviolet lithography (EUV) has come a cropper at chip-baking giant Taiwan Semiconductor Manufacturing Company (TSMC)."
Here is some more Tech News from around the web:
- AMD Press Talks Up Major Open-Source Linux Driver Features, But Fails @ Phoronix
- Galaxy S5 vs iPhone 5S specs comparison @ The Inquirer
- 'Black Phone': This handset will SELF-DESTRUCT in 30 seconds @ The Register
- Microsoft's Office 2013 Service Pack 1 slips out with fixes, features @ The Register
- Mantle no more? GDC sessions point to the next DirectX @ The Tech Report
- BlackBerry brings back call, end keys, touchpad to Q20 keyboard cutie @ The Register
- Google makes it easy for Gmail users to dump newsletters @ The Inquirer
- Taste-O-Vision Is Now A Thing @ Hack a Day
- The TR Podcast 150: From Mantle to Maxwell, and beyond