Intel Technology and Manufacturing Day in China

Subject: General Tech | September 19, 2017 - 11:33 PM |
Tagged: Intel, China, cannon lake, coffee lake, 10nm, 14nm+, 14nm++, 22FFL, GLOBALFOUNDRIES, Samsung, 22FDX

Today in China Intel is holding their Technology and Manufacturing Day. Unlike previous "IDF" events this appears to be far more centered on the manufacturing aspects of Intel's latest process nodes. During presentations Intel talked about their latest steps down the process ladder to smaller and smaller geometries all the while improving performance and power efficiency.
 
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Mark Bohr presenting at Intel Technology and Manufacturing Day in China. (Image courtesy of Intel Corporation)
 
It really does not seem as though 14nm has been around as long as it has, but the first Intel products based on that node were released in the 2nd half of 2014.  Intel has since done further work on the process. Today the company talked about two other processes as well as products being made on these nodes.
 
The 10nm process has been in development for some time and we will not see products this year. Instead we will see two product cycles based on 14nm+ and 14nm++ parts. Intel did show off a wafer of 10nm Cannon Lake dies. Intel claims that their 10nm process is still around 3 years more advanced than the competition. Other foundry groups have announced and shown off 10nm parts, but overall transistor density and performance does not look to match what Intel has to offer.
 
We have often talked about the marketing names that these nodes have been given, and how often their actual specifications have not really lived up to the reality. Intel is not immune to this, but they are closer to describing these structures than the competition. Even though this gap does exist, competition is improving their products and offering compelling solutions at decent prices so that fabless semi firms can mostly keep up with Intel.
 
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Nothing like handling a 10nm Cannon Lake wafer with bare hands! (Image courtesy of Intel Corporation)
 
A new and interesting process is being offered by intel in the form of 22FFL. This is an obviously larger process node, but it is highly optimized for low power operation with far better leakage characteristics than the previous 22nm FF process that Intel used all those years ago. This is aimed at the ultra-mobile devices with speeds above 2 GHz. This seems to be a response to other low power lines like the 22FDX product from GLOBALFOUNDRIES. Intel did not mention potential RF implementations which is something of great interest from those also looking at 22FDX.
 
Perhaps the biggest news that was released today is that of Intel Custom Foundry announcing and agreement with ARM to develop and implement those CPUs on the upcoming 10nm process. This can have a potentially huge impact depending on the amount of 10nm line space that Intel is willing to sell to ARM's partners as well as what timelines they are looking at to deliver products. ARM showed off a 10nm test wafer of Cortex-A75 CPUs. The company claims that they were able to design and implement these cores using industry standard design flows (automated place and route, rather than fully custom) and achieving performance in excess of 3 GHz.
 
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Gus Yeung of ARM holding a 10nm Cortex-A75 based CPUs designed by Intel. (Image courtesy of Intel Corporation)
 
Intel continues to move forward and invest a tremendous amount of money in their process technology. They have the ability to continue at this rate far beyond that of other competitors. Typically the company does a lot of the heavy lifting with the tools partners, which then trickles down to the other manufacturers. This has allowed Intel to stay so far ahead of the competition, and with the introduction of 14nm+, 14nm++, and 10nm they will keep much of that lead. Now we must wait and see what kind of clockspeed and power performance we see from these new nodes and how well the competition can react and when.